| Zhifeng Yang, Na Li, Xu Wang, Zhixiang Wang, and Zenglin Wang, Bottom-Up Filling in Electroless Plating with an Addition of PEG–PPG Triblock Copolymers, Electrochem. Solid-State Lett., 2010, 13(7), D947-49Zhixin Li, Na Li, Lie Yin, Yue He, and Zenglin Wang, An environment-friendly surface pretreatment of ABS resin prior to electroless plating, Electrochem. Solid-State Lett., 2009, 12(12), D92-95 Zenglin Wang, Zonghuai Liu, Zupei Yang, Shoso Shingubara. Characterization of sputtered tungsten nitride film and its application to Cu electroless plating. Microelectron. Eng. 2008, 85, 395-400 Zenglin Wang, Zhijuan Liu, Hongyan Jiang, Xiu Wei Wang. Bottom-up fill mechanisms of electroless copper plating with addition of mercapto alkyl carboxylic acid. J. Vac. Sci. Technol. B, 2006, 24(2), 803-806 Zenglin Wang, Shoso Shingubara, Hiroyuki Sakaue, Takayuki Takahagi. Bottom-up copper fill with addition of mercapto alkyl carboxylic acid in electroless plating. Electrochimi. Acta. 2006, 51, 2442-2446 Zenglin Wang, Shoso Shingubara, Hiroyuki Sakaue, Takayuki Takahagi. Characterization of electroless-plated Cu film over Pd catalytic layer formed by an ionized cluster beam. J. Electrochem. Soc. 2005,152 (10), C682-C687 Zenglin Wang, Osamu Yaegashi, Hiroyuki Sakaue, Takayuki Takahagi and Shoso Shingubara. Bottom-up fill for submicrometer copper via holes of ULSIs by electroless plating. J. Electrochem. Soc. 2004, 151(12), C781-C785 Zenglin Wang, Osamu Yaegashi, Hiroyuki Sakaue, Takayuki Takahagi and Shoso Shingubara. Effect of additives on hole fill property in electroless copper plating. Jpn. J. Appl. Phys. 2004, 43(10), 7000-7001 Zenglin Wang, Osamu Yaegashi, Hiroyuki Sakaue, Shoso Shingubara and Takayuki Takahagi. Suppression of native oxide growth in sputtered TaN films and its application for Cu electroless plating. J. Appl. Phys. 2003, 97(7), 4697-4701 Zenglin Wang, Osamu Yaegashi, Hiroyuki Sakaue, Takayuki Takahagi and Shoso Shingubara. Highly adhesive electroless Cu layer formation by ultra thin ICB-Pd catalytic layer for sub 100 nm Cu interconnections. Jpn. J. Appl. Phys. Express Lett. 2003, 42(10B), L1223-L1225 Zenglin. Wang, T. Ida, H. Sawa, H. Sakaue, S. Shingubara and T. Takahagi. Electroless plating of copper on metal-nitride diffusion barriers initiated by displacement plating. Electrochem. Solid-State Lett. 2003, 6(3), C38-C41 |
